The PVD process is a highly controlled and precise surface treatment method that delivers a thin film coating on a variety of materials. The process requires careful control of the vacuum and deposition parameters to achieve a consistent and uniform coating thickness. Let’s break down the basic steps for PVD a part:

• Cleaning and preparing surfaces for coating
• The material to be coated is loaded into a vacuum chamber
• The vacuum chamber is evacuated to create a low-pressure environment, which allows for the deposition of the coating material
• The coating material is heated, causing it to vaporize and form a plasma of ions and neutral atoms
• The plasma is ionized by a high-energy electrical field, which accelerates the ions towards the surface of the substrate
• The ions and neutral atoms deposit onto the substrate
• The coated substrate is allowed to cool to room temperature
• The coated substrate is unloaded from the vacuum chamber